This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Gang-soo Chu: Innovator in Semiconductor Technology
Introduction
Gang-soo Chu is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in methods for etching metal films.
Latest Patents
Gang-soo Chu holds a patent titled "Method for etching metal film containing aluminum and method for forming interconnection line of semiconductor device using the same." This innovative method involves etching a metal film containing aluminum using a hard mask. The process includes forming a metal film on a semiconductor substrate and applying a hard mask pattern. The etching is performed using an etching gas that includes carbon, with the hard mask serving as the etching mask. Notably, the hard mask pattern can be made from an oxide film or a nitride film, eliminating the need for a capping layer for the etched metal layer.
Career Highlights
Gang-soo Chu is currently employed at Samsung Electronics Co., Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in improving the efficiency and effectiveness of semiconductor device manufacturing.
Collaborations
One of his notable coworkers is Dong-yun Kim, with whom he has likely collaborated on various projects within the semiconductor field.
Conclusion
Gang-soo Chu's innovative methods in semiconductor technology highlight his expertise and contributions to the industry. His patent reflects a significant advancement in the etching process, showcasing his role as a key inventor in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile