Meitar, Israel

Gal Daniel Gutterman


Average Co-Inventor Count = 9.3

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Innovations by Gal Daniel Gutterman

Introduction

Gal Daniel Gutterman is an accomplished inventor based in Meitar, Israel. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced methods for examining semiconductor specimens, which are crucial for the development of modern electronic devices.

Latest Patents

Gutterman's latest patents include innovative systems and methods for image generation and local shape deviation detection in semiconductor specimens. The first patent, titled "Image generation for examination of a semiconductor specimen," describes a method that involves obtaining a sequence of frames from an area of the specimen using an electron beam tool. This method allows for the registration of multiple sets of frames from various directions, ultimately generating a comprehensive image of the specimen. The second patent, "Local shape deviation in a semiconductor specimen," outlines a technique for detecting local shape deviations in structural elements. This method includes extracting actual contours from images and estimating reference contours using Fourier descriptors, enabling precise measurements of deviations.

Career Highlights

Gutterman is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of semiconductor technology. His expertise in image processing and structural analysis has positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Gutterman has collaborated with talented professionals, including David Uliel and Yan Avniel. These partnerships have fostered innovation and contributed to the successful development of his patented technologies.

Conclusion

Gal Daniel Gutterman's work exemplifies the spirit of innovation in semiconductor technology. His patents reflect a deep understanding of the complexities involved in semiconductor examination and shape detection. Through his contributions, he continues to advance the field and inspire future developments.

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