Lambersart, France

Gaetan J Mairesse

This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gaetan J Mairesse. Retrieved from https://idiyas.com/inventor/gaetan-j-mairesse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Gaetan J Mairesse: Innovator in Photographic Processing

Introduction

Gaetan J Mairesse is a notable inventor based in Lambersart, France. He has made significant contributions to the field of photographic processing through his innovative methods. His work focuses on enhancing the longevity and efficiency of photographic developers.

Latest Patents

Mairesse holds a patent for a method aimed at minimizing the aerial oxidation of photographic developers. This invention involves a technique to decrease the oxygen content in the atmosphere above photographic processing baths. The method utilizes a solid electrolyte composed of bismuth, vanadium, or another transition metal. By implementing this method, the oxidation in air is minimized, thereby extending the life of the processing bath. He has 1 patent to his name.

Career Highlights

Gaetan J Mairesse is associated with the Eastman Kodak Company, a leader in imaging and photographic technology. His role at the company has allowed him to work on groundbreaking innovations that have impacted the industry.

Collaborations

Mairesse has collaborated with notable colleagues, including Olivier Jean Poncelet and Guy J Nowogrocki. These partnerships have contributed to the advancement of photographic processing technologies.

Conclusion

Gaetan J Mairesse is a distinguished inventor whose work in minimizing oxidation in photographic developers has made a lasting impact on the industry. His innovative methods continue to influence the field of photography.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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