The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2000

Filed:

Nov. 13, 1998
Applicant:
Inventors:

Didier J Martin, Givry, FR;

Olivier J Poncelet, Chalon sur Saone, FR;

Jean-Claude F Boivin, Wattrelos, FR;

Gaetan J Mairesse, Lambersart, FR;

Guy J Nowogrocki, Lille, FR;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
205765 ; 205634 ; 205770 ;
Abstract

The invention concerns a method for decreasing the oxygen content of the atmosphere above photographic processing baths. The method comprises using a solid electrolyte which is a compound of bismuth, vanadium or another transition metal. The oxidation in air is thus minimized and the life of the bath is extended.


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