Company Filing History:
Years Active: 2018
Title: Gaddi S Haase: Innovator in Imprint Lithography
Introduction
Gaddi S Haase is a prominent inventor based in Albuquerque, NM (US). He has made significant contributions to the field of imprint lithography, particularly through his innovative patent that addresses challenges in the manufacturing process.
Latest Patents
Gaddi S Haase holds a patent for an "Imprint lithography template and method for zero-gap imprinting." This invention provides imprint lithography templates that feature leading and trailing edge borders, achieving zero-gap imprinting between adjacent fields. The design includes dummy features oriented parallel to the mesa edge and a recess in the trailing edge border that overlaps with adjacent imprinted fields. This innovative approach ensures full-feature height features in the pattern exclusion zones, preventing gaps that could lead to non-uniformity in downstream processes such as etching and chemical mechanical polishing (CMP). He has 1 patent to his name.
Career Highlights
Gaddi S Haase is currently associated with Canon Nanotechnologies, Inc., where he continues to push the boundaries of technology in the field of nanotechnology and imprint lithography. His work has been instrumental in enhancing the precision and efficiency of manufacturing processes.
Collaborations
Gaddi has collaborated with notable colleagues, including Kosta S Selinidis and Zhengmao Ye, contributing to advancements in their shared field of expertise.
Conclusion
Gaddi S Haase's innovative work in imprint lithography exemplifies the impact of creativity and technical expertise in advancing manufacturing technologies. His contributions continue to influence the industry and pave the way for future innovations.