Santa Clara, CA, United States of America

Gabriela Alva

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Gabriela Alva from Santa Clara, CA

Introduction: Gabriela Alva is a notable inventor based in Santa Clara, California. With two patents to her name, she has made significant contributions to the field of material engineering through innovative etching methods. Gabriela works at Applied Materials, Inc., where she collaborates closely with her esteemed colleague, Nancy Fung.

Latest Patents: Gabriela Alva's latest patents focus on advanced methods for etching structures and smoothing sidewalls. One of her patented methods involves creating a hard mask layer on a material layer and utilizing a two-step etching process. The first etching process utilizes a continuously supplied gas to form features, while the second process, which smooths the sidewalls, involves pulsing a different etching gas. Her other patent describes a method where etching is conducted with a mixture of an etching gas and an oxygen-containing gas, with the oxygen being supplied in pulses. These innovations are pivotal for enhancing precision in semiconductor manufacturing processes.

Career Highlights: Gabriela has demonstrated remarkable expertise in her field through her work at Applied Materials, Inc. Her inventive solutions have not only furthered her career but have also contributed to advancements in semiconductor technology. Being able to hold two patents showcases her creativity and technical skills, underlining her role as an influential figure in her industry.

Collaborations: At Applied Materials, Gabriela Alva collaborates with various talented individuals, including her coworker Nancy Fung. Their partnership highlights the importance of teamwork and diversity in driving innovation in technology and developing groundbreaking methods that push the boundaries of current capabilities in etching processes.

Conclusion: Gabriela Alva is a remarkable inventor whose innovative approaches to material etching are paving the way for advancements in the semiconductor industry. With her two patents and collaboration with talented professionals like Nancy Fung, she continues to make invaluable contributions to her field, strengthening the foundation of applied materials technology.

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