Gabriel Krier

Title: Gabriel Krier: Innovator in Ion Beam Technology

Introduction

Gabriel Krier is a notable inventor based in Court-St-Etiene, Belgium. He has made significant contributions to the field of ion beam technology, holding 2 patents that showcase his innovative approach to treatment devices and control systems.

Latest Patents

Krier's latest patents include a "Treatment device for delivering a treatment plan for flash deposition with an accelerator of charged particles by pencil beam scanning." This device features a pulsed particles accelerator and a processor that controls the delivery of treatment plans by depositing charged particles into a flash volume. The method optimizes the time required to deposit a target dose into cells by combining flash spots into sets and systematically delivering doses.

Another significant patent is the "Method and system for controlling ion beam pulses extraction." This invention relates to a method for controlling the extraction of ion beam pulses produced by a synchrocyclotron. The system utilizes electrodes placed in a magnetic field, with an alternating voltage applied to modulate the frequency cyclically. This innovation enhances the precision and efficiency of ion beam extraction.

Career Highlights

Gabriel Krier is currently employed at Ion Beam Applications S.A., a company renowned for its advancements in ion beam technology. His work focuses on developing cutting-edge solutions that improve treatment delivery and control mechanisms in medical applications.

Collaborations

Krier collaborates with esteemed colleagues such as Yves Claereboudt and Rudi Labarbe, contributing to a dynamic team dedicated to pushing the boundaries of ion beam technology.

Conclusion

Gabriel Krier's innovative work in ion beam technology and his contributions through his patents reflect his commitment to advancing medical treatment methods. His expertise and collaboration with fellow professionals continue to drive progress in this critical field.