The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Jul. 07, 2022
Ion Beam Applications, Louvain-la-neuve, BE;
Rudi Labarbe, Louvain-la-neuve, BE;
Lucian Hotoiu, Louvain-la-neuve, BE;
Arnaud Pin, Louvain-la-neuve, BE;
Yves Claereboudt, Louvain-la-neuve, BE;
Gabriel Krier, Louvain-la-neuve, BE;
Ion Beam Applications, Louvain-la-neuve, BE;
Abstract
A treatment device includes a pulsed particles accelerator and a processor for controlling the latter to deliver a treatment plan by deposition at HDR of charged particles into a flash volume (Vht) by PBS. To shorten the time for depositing a target dose (Dti) into the cells spanned by the flash spots (Si) of the flash volume (Vht), the flash spots are combined into k sets of n flash spots (Si). After depositing a jpulse dose (Dij) into the cells spanned by a iflash spot (Si) the beam commutes from the ith flash spot (Si) to a next (i+1)th flash spot according to a flash scanning subsequence to deposit a jth dose into the cells spanned by each of the subsequent flash spots of the flash scanning subsequence, until returning to the ith flash spot to deposit a (j+1)th dose (Di(j+1)), and so on When all the cells spanned by all the flash spots of a set have received their corresponding target dose, the beam moves to a next set of combined flash spots and repeats the foregoing pulse deposition steps.