This inventor holds 2 USPTO granted patents. Top assignees: Micron Display Technology, Inc., Micron Technology Incorporated. Active years: 1999-2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Boise, ID (US) (1999)
- El Paso, TX (US) (2000)
Company Filing History:

Years Active: 1999-2000
Title: G Hugo Urbina: Innovator in Semiconductor Technology
Introduction
G Hugo Urbina is a notable inventor based in El Paso, TX (US), recognized for his contributions to semiconductor technology. With a total of two patents to his name, Urbina has made significant advancements in the field of polishing apparatuses used in semiconductor manufacturing.
Latest Patents
Urbina's latest patents include an "Apparatus and method for semiconductor planarization." This innovative polishing apparatus features a lower pad and an upper pad, where the upper pad is equipped with an abrasive surface. The design allows for the formation of channels in the upper pad's abrasive surface, which enhances the distribution of slurry during the polishing process. Another patent, titled "Method and system to increase delivery of slurry to the surface of large," involves cutting grooves into an under pad of a polishing pad assembly. This design facilitates controlled delivery of slurry across the pad assembly's surface, improving efficiency in semiconductor polishing.
Career Highlights
Throughout his career, G Hugo Urbina has worked with prominent companies in the semiconductor industry, including Micron Technology Incorporated and Micron Display Technology, Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.
Collaborations
Urbina has collaborated with various professionals, including his coworker Kevin W Tjaden, to further enhance his inventions and contribute to advancements in semiconductor technology.
Conclusion
G Hugo Urbina's work in semiconductor planarization has led to significant innovations that improve the efficiency of polishing processes. His patents reflect a deep understanding of the technical challenges in the industry and showcase his commitment to advancing semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile