Fuyue Wang

Title: Fuyue Wang: Innovator in Circuit Design

Introduction

Fuyue Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of circuit design, holding a total of three patents. His work focuses on advanced technologies that enhance the performance and efficiency of electronic systems.

Latest Patents

Fuyue Wang's latest patents include a dual path phase-locked loop circuit and a fast settling bias circuit. The dual path phase-locked loop (PLL) circuit features a switched capacitor filter topology, which includes both an integral path and a proportional path. Each path consists of a charge pump and a loop filter, with outputs from a phase frequency detector (PFD) directed to both charge pumps. The integral path charge pump connects to a capacitor, providing a control voltage for a voltage-controlled oscillator (VCO). Meanwhile, the proportional path utilizes a switched capacitor network to generate its control voltage, together dictating the VCO's output frequency. His fast settling bias circuit employs a successive-approximation-register-analog-to-digital converter (SAR-ADC) based settling loop, designed for rapid settling of a heavily loaded bias node.

Career Highlights

Fuyue Wang is currently employed at Cadence Design Systems, Inc., where he continues to innovate in circuit design. His expertise in developing advanced electronic circuits has positioned him as a key player in the industry.

Collaborations

Fuyue has collaborated with notable colleagues, including Ling Chen and Thomas Evan Wilson, contributing to various projects that enhance circuit design technologies.

Conclusion

Fuyue Wang's contributions to circuit design through his innovative patents and collaborations highlight his significant role in advancing electronic technologies. His work continues to influence the field and inspire future innovations.