Kyoto, Japan

Futaba Kawakami

This inventor holds 1 USPTO granted patent. Top assignee: San-Apro Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Futaba Kawakami. Retrieved from https://idiyas.com/inventor/futaba-kawakami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Futaba Kawakami and Photoacid Generator Innovation.

Introduction

Futaba Kawakami is an inventor associated with San-Apro Limited in Kyoto, Japan. Her listed patent work focuses on photoacid generation and photosensitive materials.

Latest Patents

Kawakami is credited with 1 patent: “Photoacid Generator, and Photosensitive Composition Using Same.” The invention concerns a metal-complex photoacid generator with a ligand formed from five-membered aromatic heterocyclic compounds, joined directly or through π-conjugation. Its central metal has one or two axial ligands, each with an onium salt structure.

The patent describes a generator designed to produce acid effectively even when light-attenuating or light-blocking substances, such as colorants, are present at high concentrations or when the film is thick. It is intended to work with visible-to-infrared light, including low-energy infrared light, and to support a highly curable photosensitive composition.

Career Highlights

Kawakami’s listed patent reflects work on improving photoacid generation under challenging optical conditions. The approach may be relevant to photosensitive compositions that need to cure despite limited light transmission.

Collaborations

The supplied information identifies Atsushi Shiraishi as Kawakami’s coworker at San-Apro Limited. No further details about their collaboration are provided.

Conclusion

Futaba Kawakami’s listed invention addresses photoacid generation and curing performance in photosensitive compositions exposed to visible or infrared light, including conditions where light transmission is reduced.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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