This inventor holds 1 USPTO granted patent. Top assignee: Dexerials Corporation. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: **Fusashige Tokutake: Innovator in Sputtering Target Technology**
Introduction
Fusashige Tokutake is a distinguished inventor based in Sendai, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. Tokutake's innovative work has resulted in a patented invention that addresses crucial performance issues in sputtering technologies.
Latest Patents
One of Tokutake's remarkable patents is titled "Mn–Zn–W–O sputtering target and production method therefor." This patent introduces a Mn–Zn–W–O sputtering target characterized by its excellent crack resistance, which is essential for high-performance applications. The chemical composition of the target comprises manganese (Mn), zinc (Zn), tungsten (W), and oxygen (O). This invention also outlines a specific production method that ensures the integrity and performance of the sputtering target.
Career Highlights
Fusashige Tokutake is affiliated with Dexerials Corporation, a company known for its focus on advanced materials. Through his work with the company, he has pushed the boundaries of what is possible in the realm of material engineering. His dedication and innovative mindset have allowed him to secure a patent that is valuable to both the industry and academic research.
Collaborations
Tokutake works alongside talented colleagues, including Junichi Sugawara and Yuichi Kamori. Together, they contribute to advancing the field of sputtering target technology, enhancing the performance and reliability of materials used in various applications.
Conclusion
Fusashige Tokutake’s work exemplifies the spirit of innovation in material science. His patented Mn–Zn–W–O sputtering target represents a significant advancement, not only showcasing his ingenuity but also benefiting industries reliant on high-quality sputtering technology. As research continues, Tokutake's contributions are poised to influence future developments in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
