Fumiyoshi Ofuji

Title: Fumiyoshi Ofuji: Innovator in Plasma Processing Technology

Introduction

Fumiyoshi Ofuji is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative methods have advanced the efficiency and effectiveness of film processing in various applications.

Latest Patents

Fumiyoshi Ofuji holds a patent for a plasma processing method. This method is designed for uniformly removing a processing target film in a lateral direction, even when the depth of a trench is increased. Specifically, it pertains to plasma-etching a tungsten film of a stacked film formed by alternately stacking an insulating film and the tungsten film. The method includes a first depositing step, a first etching step, a second depositing step, a second etching step using a mixed gas, and a third etching step. The process is repeated a predetermined number of times to achieve optimal results.

Career Highlights

Fumiyoshi Ofuji is currently employed at Hitachi High-Tech Corporation. His work at this esteemed company has allowed him to further develop his expertise in plasma processing technologies. His innovative contributions have been recognized within the industry.

Collaborations

Fumiyoshi Ofuji has collaborated with notable colleagues such as Kenta Nakajima and Toru Ito. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Fumiyoshi Ofuji is a distinguished inventor whose work in plasma processing technology has made a significant impact. His patent for a plasma processing method showcases his innovative approach to solving complex challenges in the field. His contributions continue to influence advancements in technology and processing methods.