Osaka, Japan

Fuminori Shibayama

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: C.uyemura Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fuminori Shibayama. Retrieved from https://idiyas.com/inventor/fuminori-shibayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Fuminori Shibayama: Innovator in Surface Treatment Technology

Introduction

Fuminori Shibayama is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of surface treatment technology, particularly in the development of etchants for aluminum and aluminum alloys. His innovative approach aims to enhance the quality of metal plating processes.

Latest Patents

Shibayama holds a patent for an etchant and method of surface treatment of aluminum or aluminum alloy. The patent focuses on providing an etchant that enables good deposition of metal plating, such as nickel plating, despite its acidity. The etchant contains a zinc compound and a fluorine compound, with a pH range of 4.5 to 6.5, which is crucial for effective surface treatment.

Career Highlights

Fuminori Shibayama is associated with C. Uyemura Co., Ltd., a company known for its advancements in chemical solutions for the electronics and metal finishing industries. His work has contributed to the company's reputation for innovation and quality in surface treatment technologies.

Collaborations

Shibayama has collaborated with notable colleagues, including Takuma Maekawa and Katsuhisa Tanabe. These partnerships have fostered a creative environment that encourages the development of cutting-edge solutions in their field.

Conclusion

Fuminori Shibayama's contributions to surface treatment technology exemplify the importance of innovation in enhancing industrial processes. His patent for an effective etchant demonstrates his commitment to improving metal plating techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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