Fumimasa Hirikiri

Title: Fumimasa Hirikiri: Innovator in Wafer Production Technology

Introduction

Fumimasa Hirikiri is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of wafer production technology, particularly in methods that enhance the efficiency and effectiveness of etching processes. With a total of 2 patents, Hirikiri's work is recognized for its innovative approach to utilizing group III nitride crystals in wafer manufacturing.

Latest Patents

Hirikiri's latest patents include a "Structure Production Wet Etch Method" and a "Structure Production Apparatus." These patents describe a process for preparing a wafer with a diameter of two inches or more, where at least the surface of the wafer is formed from a group III nitride crystal. The method involves preparing an alkaline or acidic etching liquid containing a peroxodisulfate ion as an oxidizing agent. The wafer is immersed in the etching liquid, ensuring that its surface is parallel to the liquid's surface. Light is then radiated from the surface side of the etching liquid onto the wafer's surface without agitating the liquid. This innovative approach defines first and second etching areas on the wafer's surface, allowing for precise etching through perpendicular light radiation.

Career Highlights

Throughout his career, Hirikiri has worked with prominent companies, including Sumitomo Chemical Company, Limited and Sciocs Company Limited. His experience in these organizations has contributed to his expertise in wafer production and etching technologies.

Collaborations

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Conclusion

Fumimasa Hirikiri's contributions to wafer production technology through his innovative patents highlight his role as a significant inventor in the field. His work continues to influence advancements in the manufacturing processes of semiconductor materials.