This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Jsr Corporation. Active years: 2002-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002-2004
Title: Fumiko Yonezawa: Innovator in Radiation-Sensitive Technologies
Introduction
Fumiko Yonezawa is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of radiation-sensitive compositions and organic electronic devices. With a total of 2 patents, her work has garnered attention in the technology sector.
Latest Patents
Yonezawa's latest patents include a radiation-sensitive composition and an insulating film, as well as an organic EL display element. Her innovative radiation-sensitive resin composition is particularly noteworthy for its application in interlaminar insulating films. These advancements are crucial for enhancing the performance and reliability of electronic devices.
Career Highlights
Fumiko Yonezawa is currently employed at JSR Corporation, a leading company in the development of advanced materials. Her role at JSR has allowed her to focus on cutting-edge research and development in the field of electronics.
Collaborations
Yonezawa has collaborated with notable colleagues, including Isao Nishimura and Masayoshi Suzuki. These partnerships have contributed to her success and the advancement of her innovative projects.
Conclusion
Fumiko Yonezawa's contributions to radiation-sensitive technologies and her work at JSR Corporation highlight her as a key figure in the field of innovation. Her patents reflect her commitment to advancing technology and improving electronic devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile