Yokohama, Japan

Fumihiro Inoue

This inventor holds 1 USPTO granted patent. Top assignees: Disco Corporation, Yokohama National University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumihiro Inoue. Retrieved from https://idiyas.com/inventor/fumihiro-inoue-b9k9ve7z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Fumihiro Inoue: Inventor of a Laminated Assembly Manufacturing Method.

Introduction

Fumihiro Inoue is an inventor associated with Yokohama, Japan. His patent work includes a method for manufacturing a laminated assembly, and his record lists 1 patent.

Latest Patents

Inoue’s patent, “Method of Manufacturing Laminated Assembly,” describes a process for temporarily joining a plate-shaped object to a support substrate and then transferring the object to another support. The method deposits oxide films on the plate-shaped object and a temporary support substrate, hydrophilizes the exposed film surfaces, and temporarily joins the two components. A joint member is then formed on a support substrate, which is joined to the plate-shaped object. The process heats the assembly to vaporize water in the oxide film before separating the temporary support substrate. This approach outlines a controlled sequence for producing a laminated assembly.

Career Highlights

Inoue’s listed professional affiliations include Disco Corporation and Yokohama National University. His patent reflects work on manufacturing processes involving oxide films, temporary bonding, and substrate separation.

Collaborations

His listed coworkers include Shunsuke Teranishi and Akihito Kawai.

Conclusion

Fumihiro Inoue’s patent documents a staged manufacturing method for joining and separating components in a laminated assembly, alongside professional affiliations with Disco Corporation and Yokohama National University.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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