Yokohama, Japan

Fumihiko Sakata

This inventor holds 3 USPTO granted patents. Top assignee: Ebara Corporation. Active years: 1997-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumihiko Sakata. Retrieved from https://idiyas.com/inventor/fumihiko-sakata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 57(Granted Patents)


Company Filing History:


Years Active: 1997-2000

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3 patents (USPTO):Explore Patents

Title: Fumihiko Sakata: Innovator in Semiconductor Polishing Technology

Introduction

Fumihiko Sakata is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor polishing technology. With a total of 3 patents to his name, Sakata's work has advanced the efficiency and effectiveness of polishing processes in semiconductor manufacturing.

Latest Patents

Sakata's latest patents include a "System for detecting the endpoint of the polishing of a semiconductor." This innovative polisher is equipped with a vibration detection system that can identify vibrations caused by the interaction between the article being polished and the polishing member. This system operates without the noise typically generated by prior art polishers. The design features a turntable assembly with a polishing surface and a rotatable carrier assembly that holds the article under pressure during polishing. A vibration detector on the carrier assembly captures the vibrations, while a light signal emission device generates light signals in response to the detected vibrations.

Another significant patent is the "Method and apparatus for determining endpoint during a polishing process." This invention outlines a method for determining a planar endpoint on a workpiece, such as a semiconductor wafer, during polishing. The workpiece is held by a top ring and pressed against a polishing platen. As the workpiece is polished, changes in the frictional force between the workpiece and the platen are detected. A reference time is established based on these changes, allowing for precise determination of the endpoint during the polishing process.

Career Highlights

Fumihiko Sakata is currently employed at Ebara Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the capabilities of polishing equipment, making significant strides in the semiconductor manufacturing process.

Collaborations

Sakata has collaborated with notable colleagues, including Norio Kimura and Tamami Takahashi. Their combined expertise has contributed to the development of advanced technologies in the semiconductor industry.

Conclusion

Fumihiko Sakata's contributions to semiconductor polishing technology have established him as a key figure in the field. His innovative patents and ongoing work at Ebara Corporation continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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