Fumihiko Ota

Title: Fumihiko Ota: Innovator in Photosensitive Resin Technology

Introduction

Fumihiko Ota is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in various applications, including flexible printed circuit boards.

Latest Patents

Ota holds a patent for a photosensitive resin composition and its application of photosensitivity. This innovative composition includes a resin with an amide bond, an oxyalkylene group, and a carboxyl group, along with a photopolymerizable compound and a photopolymerization initiator. The resulting material exhibits alkali developability, good sensitivity, and photocurability. It also allows for efficient pattern formability through photolithography and demonstrates excellent application workability to films. The cured products produced from this composition possess remarkable properties, including folding endurance, solder reflow heat resistance, solvent resistance, bondability, and nonflammability.

Career Highlights

Fumihiko Ota is associated with Hitachi, Ltd., a leading company in technology and innovation. His work has significantly impacted the development of photosensitive elements and laminates, enhancing the capabilities of flexible printed circuit boards.

Collaborations

Ota has collaborated with notable colleagues, including Jin Amanokura and Ritsuko Obata, contributing to advancements in their field.

Conclusion

Fumihiko Ota's contributions to photosensitive resin technology highlight his innovative spirit and dedication to advancing materials science. His work continues to influence the development of essential components in modern electronics.