Fumihiko Higuchi

Title: Fumihiko Higuchi: Innovator in Plasma Processing Technology

Introduction

Fumihiko Higuchi is a notable inventor based in Beverly, MA (US). He has made significant contributions to the field of plasma processing technology. With a total of 3 patents to his name, Higuchi's work has advanced the capabilities of plasma processing apparatuses.

Latest Patents

Higuchi's latest patents include a plasma processing apparatus designed to perform plasma processes on target substrates. This apparatus features first and second electrodes positioned to oppose each other within a process chamber. An RF field is generated between these electrodes, which turns a process gas into plasma through excitation. The apparatus is equipped with an RF power supply that connects to one of the electrodes via a matching circuit. This matching circuit automatically adjusts input impedance relative to the RF power. Additionally, a variable impedance setting section is linked to a predetermined member that is electrically coupled with the plasma. This section sets a backward-direction impedance against an RF component input from the plasma. A controller is responsible for supplying a control signal regarding the preset value of the backward-direction impedance to the impedance setting section.

Career Highlights

Fumihiko Higuchi is currently employed at Tokyo Electron Limited, where he continues to innovate in the field of plasma technology. His work has been instrumental in enhancing the efficiency and effectiveness of plasma processing systems.

Collaborations

Higuchi has collaborated with notable colleagues, including Akitaka Shimizu and Asao Yamashita. Their combined expertise has contributed to the development of advanced plasma processing technologies.

Conclusion

Fumihiko Higuchi's contributions to plasma processing technology reflect his dedication to innovation and excellence. His patents and collaborations have significantly impacted the industry, showcasing his role as a leading inventor in this field.