Fumiaki Shigemitsu

Title: Fumiaki Shigemitsu: Innovator in Photomask Technology

Introduction

Fumiaki Shigemitsu is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of photomask technology, holding a total of 6 patents. His innovative approaches have advanced the methods used in the semiconductor manufacturing industry.

Latest Patents

One of Shigemitsu's latest patents is a photomask repair method and apparatus. This method involves scanning an electron beam across the main surface of the photomask to produce a pattern image. It identifies the position of defective portions from the pattern image and applies an electron beam to the region to be etched, including the defective portion, under a gas atmosphere that facilitates chemical etching. The electron beam is shaped and applied parallel to the borderline between the non-defective pattern and the defect. Another notable patent is a method for forming a highly precise resist pattern. This method includes applying a resist material to a substrate, baking the resist film, cooling it in a controlled manner, selectively irradiating it with electromagnetic waves or particle beams, and developing the resist film to create a resist pattern.

Career Highlights

Fumiaki Shigemitsu has worked with notable companies such as Tokyo Shibaura Denki and Toshiba Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field.

Collaborations

Shigemitsu has collaborated with esteemed colleagues, including Kinya Usuda and Yoshihide Kato. Their combined expertise has fostered innovation and development in photomask technologies.

Conclusion

Fumiaki Shigemitsu's contributions to photomask technology and his innovative patents have significantly impacted the semiconductor industry. His work continues to inspire advancements in precision manufacturing techniques.