Fukusaburou Ishihara

Title: Fukusaburou Ishihara: Innovator in Semiconductor Cleaning Solutions

Introduction

Fukusaburou Ishihara is an accomplished inventor based in Ibaraki-ken, Japan. He has made significant contributions to the field of semiconductor device production, particularly through his innovative cleaning solutions.

Latest Patents

Ishihara holds a patent for a cleaning agent designed for use in producing semiconductor devices. The patent, titled "Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same," describes a specialized aqueous solution comprising several key components: a fluorine-containing compound, a salt of boric acid, a water-soluble organic solvent, and optionally, a specific quaternary ammonium salt or specific ammonium salt of an organic carboxylic acid. This innovative cleaning agent is effective at removing polymeric deposits from via holes and conductive line patterns formed during the dry etching process, all while preserving the dimensions of these critical components.

Career Highlights

Throughout his career, Ishihara has demonstrated a deep understanding of semiconductor manufacturing processes and has focused on developing solutions to enhance efficiency and quality. His sole patent reflects his dedication to advancing technology in this sector.

Collaborations

Fukusaburou Ishihara has collaborated with notable peers such as Hideto Gotoh and Tsuyoshi Matsui. These collaborations have facilitated the sharing of knowledge and ideas, further enhancing the development of effective solutions for semiconductor production.

Conclusion

Fukusaburou Ishihara's contributions to the field of semiconductor cleaning agents illustrate the importance of innovation in technology. His patented solutions not only address manufacturing challenges but also pave the way for advancements in semiconductor device production.