Miaoli, Taiwan

Fu-Mei Chiu

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2002.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Fu-Mei Chiu: Innovator in Semiconductor Technology

Introduction

Fu-Mei Chiu is a notable inventor based in Miaoli, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of integrated circuits. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Fu-Mei Chiu holds a patent for the "RPO process for selective CoSix formation." This patent describes a method for forming an improved RPO layer by utilizing a composite layer and a two-step etching process in a salicide process during the fabrication of integrated circuits. The method involves creating isolation areas on a semiconductor substrate that surround and electrically isolate device areas. At least one device area is designated for silicidation, while another is not. A composite resist protective oxide layer is formed over the device areas, consisting of a first layer of oxide and a second layer of silicon oxynitride. The silicon oxynitride layer is dry etched away from the device area intended for silicidation, followed by wet etching of the oxide layer. Silicidation is then performed to complete the fabrication of the integrated circuit device. This innovative process enhances the reliability and performance of semiconductor devices.

Career Highlights

Fu-Mei Chiu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing processes that improve the quality and efficiency of integrated circuits.

Collaborations

Fu-Mei Chiu has collaborated with esteemed colleagues, including Lin-June Wu and Dian-Hau Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the semiconductor field.

Conclusion

Fu-Mei Chiu's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his role as a key figure in the industry. His work continues to influence the future of integrated circuit fabrication.

Profile summary based on public USPTO records.
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