Location History:
- Taipei, TW (1988)
- Hsinchu, TW (1993 - 2003)
Company Filing History:
3 out of 9,152 
1 out of 9 
Years Active: 1988-2003
Title: Fu-Lung Chen: Innovator in Photothermosetting Compositions and Alignment Layer Materials
Introduction
Fu-Lung Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in photothermosetting compositions and alignment layer materials. With a total of 4 patents to his name, Chen's work has had a considerable impact on various applications, including liquid crystal displays.
Latest Patents
Chen's latest patents include a photothermosetting composition comprising acrylated epoxy resin. This innovative composition contains a base resin, a photopolymerizable photomonomer or photooligomer, a photoinitiator, an epoxide compound with at least two epoxy groups, and an organic solvent. The specific ratios of the components are crucial for achieving the desired properties, such as a solder mask after curing. Another significant patent involves a low-pretilt alignment layer material, which is a diamine-containing polyamic acid. This material is formed through the polymerization of aromatic diamine and dianhydride, resulting in excellent coating, adhesion, and stability. The alignment layer is particularly useful in twisted nematic (TN) type liquid crystal displays.
Career Highlights
Throughout his career, Fu-Lung Chen has worked with prominent organizations, including the Industrial Technology Research Institute and Advance Materials Corporation. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in material technologies.
Collaborations
Chen has collaborated with notable colleagues such as Jonq-Min Liu and Yeong-Cherng Chiou. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in the field of materials science.
Conclusion
Fu-Lung Chen's contributions to the field of photothermosetting compositions and alignment layer materials highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in materials science, making him a significant figure in his industry.