The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2003

Filed:

Feb. 27, 2001
Applicant:
Inventors:

Chao-Hui Tseng, Hsinchu, TW;

Fu-Lung Chen, Hsinchu, TW;

Assignee:

Advance Materials Corporation, Taoyuan Hsien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; C08G 5/917 ; C09D / ; G03C 1/73 ;
U.S. Cl.
CPC ...
G03F 7/004 ; C08G 5/917 ; C09D / ; G03C 1/73 ;
Abstract

A photothermosetting composition is described which contains a base resin (A), a photopolymerizable photomonomer or photooligomer (B), a photoinitiator (C), an epoxide compound containing at least two epoxy groups (D), and an organic solvent. The base resin (A) an epoxide compound (a) containing at least two epoxy groups, an unsaturated monobasic acid (b), a saturated or unsaturated dibasic acid (c), and a saturated or unsaturated acid anhydride (d) according to the ratio of (a)/(b)/(c) of 1:0.90˜0.95:0.025˜0.050 and the acid value of the base resin is in the range of 40˜49 mg KOH/g. This photothermosetting component was coating on the substrate, and then dried by baking, exposed by light, developed, irradiated by ultraviolet light or heated, and cured to form a solder mask.


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