Fu-Chien Liu

Title: Fu-Chien Liu: Innovator in Photosensitive Resin Technology

Introduction

Fu-Chien Liu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His innovative work has implications for various applications, including liquid crystal display technology.

Latest Patents

Fu-Chien Liu holds a patent for a photosensitive resin composition and its manufacturing method. This patent includes a black matrix, pixel layer, protective film, color filter, and liquid crystal display apparatus. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) with an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D). Notably, the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) that features a fluorene group, a polymerizable unsaturated group, and a carbamate group. This specific composition ensures that patterns formed have no development residue and exhibit excellent sputtering resistance.

Career Highlights

Fu-Chien Liu is associated with Chi Mei Corporation, where he has been instrumental in advancing the company's research and development efforts. His expertise in photosensitive materials has positioned him as a key figure in the industry.

Collaborations

Fu-Chien Liu has collaborated with Hao-Wei Liao, contributing to the advancement of their shared projects and innovations in the field.

Conclusion

Fu-Chien Liu's work in photosensitive resin technology exemplifies the innovative spirit of modern inventors. His contributions continue to influence the development of advanced materials in the electronics industry.