The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Aug. 13, 2018
Applicant:

Chi Mei Corporation, Tainan, TW;

Inventors:

Fu-Chien Liu, New Taipei, TW;

Hao-Wei Liao, Tainan, TW;

Assignee:

Chi Mei Corporation, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); C08L 33/14 (2006.01); C08F 2/48 (2006.01); C08L 67/02 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133514 (2013.01); C08F 2/48 (2013.01); C08L 33/14 (2013.01); C08L 67/02 (2013.01); G02F 1/133512 (2013.01); C08L 2203/16 (2013.01); C08L 2203/20 (2013.01); G02F 2202/023 (2013.01);
Abstract

A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.


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