This inventor holds 1 USPTO granted patent. Top assignee: S.o.i.tec Silicon on Insulator Technologies. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Fréderic Allibert: Innovator in Field-Effect Transistor Technology
Introduction
Fréderic Allibert is a notable inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, particularly in the development of field-effect transistors. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.
Latest Patents
Fréderic Allibert holds a patent for a Multi-gate FET with a multi-layer channel. This invention involves a field-effect transistor that includes a drain, a source, and a channel in electrical contact with both the source and the drain. The channel features a multi-layer structure with at least three layers, where at least one layer possesses electrical properties that differ significantly from another layer. The design allows for the application of an electric field to the channel when the gates are polarized, enhancing the performance of the transistor.
Career Highlights
Fréderic Allibert is associated with S.O.I.TEC Silicon on Insulator Technologies, a company known for its advancements in silicon-on-insulator technology. His work at this company has positioned him as a key player in the semiconductor industry, contributing to the development of innovative solutions that meet the demands of modern electronics.
Collaborations
Fréderic collaborates with talented individuals such as Takeshi Akatsu and Bruno Ghyselen. These partnerships foster an environment of innovation and creativity, allowing for the exchange of ideas and expertise in the field of semiconductor technology.
Conclusion
Fréderic Allibert's contributions to the field of field-effect transistors exemplify his dedication to innovation and technology. His patent for the Multi-gate FET with a multi-layer channel highlights his ability to push the boundaries of semiconductor design. Through his work at S.O.I.TEC and collaborations with fellow innovators, he continues to make a significant impact in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile