Company Filing History:
Years Active: 1990
Title: The Innovative Contributions of Fritz Ketterl
Introduction
Fritz Ketterl is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique process for etching semiconductor surfaces.
Latest Patents
Ketterl holds a patent for a "Process and apparatus for etching semiconductor surfaces." This invention involves a mixture containing nitrogen-oxygen based compounds as oxidizing agents, hydrofluoric acid to dissolve oxidation products, and sulfuric acid, with the option of adding phosphoric acid as a carrier medium. This process is designed to be cyclic, allowing for efficient oxidation of the material being etched while minimizing reagent usage and environmental impact. He has 1 patent to his name.
Career Highlights
Fritz Ketterl has worked with Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, where he has applied his expertise in semiconductor technology. His work has been instrumental in advancing the methods used in the industry.
Collaborations
Ketterl has collaborated with notable colleagues such as Anton Schnegg and Gerhard Brehm. Their combined efforts have contributed to the success of various projects within their field.
Conclusion
Fritz Ketterl's innovative work in semiconductor etching processes showcases his commitment to advancing technology while being environmentally conscious. His contributions continue to influence the industry positively.