Wuppertal, Germany

Frederik Lange

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Microvision, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frederik Lange. Retrieved from https://idiyas.com/inventor/frederik-lange-41rsx7q4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Frederik Lange

Introduction

Frederik Lange is a notable inventor based in Wuppertal, Germany. He has made significant contributions to the field of optical measurement technology. His innovative approach has led to the development of a unique method for measuring distances.

Latest Patents

Frederik Lange holds a patent for a "Method and device for optically measuring distances." This patent describes a method in which a first plurality of measuring pulses is emitted during a first measuring interval by a transmitting element. Additionally, a second plurality of measuring pulses is emitted during a second measuring interval. The method involves receiving reflected measuring pulses by a receiving element and determining the times-of-flight for each received measuring pulse.

Career Highlights

Lange is currently associated with Microvision, Inc., where he continues to work on advancements in optical measurement technologies. His expertise in this area has positioned him as a valuable asset to the company.

Collaborations

Frederik Lange has collaborated with notable colleagues such as Hanno Holzhüter and Christian Fellenberg. Their combined efforts contribute to the innovative projects at Microvision, Inc.

Conclusion

Frederik Lange's work in optical measurement technology exemplifies the spirit of innovation. His patent and collaborations highlight his commitment to advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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