Frederick Lie

Title: Innovations of Frederick Lie in Maskless Lithography

Introduction

Frederick Lie is an accomplished inventor based in Dacun, Taiwan. He has made significant contributions to the field of lithography, particularly through his innovative methods that enhance the efficiency and flexibility of layer formation.

Latest Patents

Frederick Lie holds a patent for "Maskless based lithography methods." This patent describes methods of forming layers using maskless lithography. The techniques involve implementing ladders of dose change, allowing a geometric shape to be divided into overlaying sections. Each section can receive a different dose, enabling precise taper control. The taper is achieved by manipulating the geometry of the mask data into overlaying sections exposed by various doses controlled through pixel blending exposure techniques. The methods utilize a maskless lithography tool, which includes a controller for software-based mask data manipulation. This approach offers greater flexibility in tuning taper angles and photoresist thickness without incurring additional mask costs or fabrication time, providing advantages over traditional lithography methods.

Career Highlights

Frederick Lie is currently associated with Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on advancing lithography techniques that are crucial for semiconductor manufacturing and other applications.

Collaborations

Frederick has collaborated with notable colleagues, including Shih-Hsien Lee and Tingwei Chiu. Their combined expertise contributes to the innovative advancements in lithography methods.

Conclusion

Frederick Lie's contributions to maskless lithography represent a significant advancement in the field, showcasing his innovative spirit and dedication to improving manufacturing processes. His work continues to influence the industry positively.