Company Filing History:
Years Active: 2003-2006
Title: Fred Y Clark: Innovator in Semiconductor Inspection Technologies
Introduction
Fred Y Clark is a notable inventor based in Rowlett, TX (US), recognized for his contributions to semiconductor inspection technologies. With a total of 2 patents, he has made significant advancements in methods and assemblies that enhance the analysis of semiconductor devices.
Latest Patents
Clark's latest patents include "Methods for inspection sample preparation," which provides techniques for delineating different layers and interfaces for the inspection of semiconductor wafers. This method involves subjecting a sectioned portion of a wafer to a reactive ion etch process before inspection using a scanning electron microscope. Another significant patent is "Assembly and method for improved scanning electron microscope analysis of semiconductor devices." This invention features a structure with a first and second layer, where the second layer shrinks substantially when examined with a scanning electron microscope at a beam energy of at least 1.5 KeV. The surface of the structure is coated with a material composed of Iridium, which helps reduce the shrinkage of the second layer to a predetermined amount during examination.
Career Highlights
Fred Y Clark is currently employed at Texas Instruments Corporation, where he applies his expertise in semiconductor technologies. His work has contributed to the development of innovative solutions that improve the efficiency and accuracy of semiconductor inspections.
Collaborations
Clark has collaborated with notable coworkers, including Andrew L Vance and David Gerald Farber, who have also contributed to advancements in the field of semiconductor technology.
Conclusion
Fred Y Clark's innovative work in semiconductor inspection technologies has led to significant advancements in the field. His patents reflect a commitment to improving the methods used in semiconductor analysis, showcasing his role as a key inventor in this critical area of technology.