The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2006

Filed:

Aug. 13, 2002
Applicants:

Fred Y. Clark, Rowlett, TX (US);

Andrew L. Vance, Rowlett, TX (US);

David G. Farber, Wylie, TX (US);

Inventors:

Fred Y. Clark, Rowlett, TX (US);

Andrew L. Vance, Rowlett, TX (US);

David G. Farber, Wylie, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods are provided for delineating different layers and interfaces for inspection of a semiconductor wafer, wherein a sectioned portion of a wafer is subjected to a reactive ion etch process before inspection using a scanning electron microscope.


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