Santa Barbara, CA, United States of America

Fred Lange

This inventor holds 1 USPTO granted patent. Top assignee: Max-Planck-Gesellschaft Zur Förderung Der Wissenschaften E. V. . Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fred Lange. Retrieved from https://idiyas.com/inventor/fred-lange

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Fred Lange: Innovator in Epitactic GaN Layer Production

Introduction

Fred Lange is a notable inventor based in Santa Barbara, CA (US). He has made significant contributions to the field of materials science, particularly in the production of epitactic Gallium Nitride (GaN) layers. His innovative work has implications for various applications in electronics and optoelectronics.

Latest Patents

Fred Lange holds a patent for the "Production of epitactic GaN layers on substrates." This invention relates to a process for applying an epitactic GaN layer to a substrate through the pyrolysis of precursor compounds. His work in this area has advanced the understanding and capabilities of GaN layer production.

Career Highlights

Fred Lange is associated with the Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V., a prestigious research organization. His career has been marked by a commitment to innovation and excellence in research, contributing to the advancement of technology in his field.

Collaborations

Throughout his career, Fred Lange has collaborated with esteemed colleagues, including Manfred Puchinger and Fritz Aldinger. These partnerships have fostered a collaborative environment that enhances research outcomes and drives innovation.

Conclusion

Fred Lange's contributions to the production of epitactic GaN layers exemplify the impact of innovative thinking in materials science. His work continues to influence advancements in technology and research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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