The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2001

Filed:

Jun. 27, 2000
Applicant:
Inventors:

Fritz Aldinger, Leinfelden-Echterdingen, DE;

Fred Lange, Santa Barbara, CA (US);

Manfred Puchinger, Stuttgart, DE;

Thomas Wagner, Nürtingen, DE;

Joachim Bill, Stuttgart, DE;

Dieter Rodewald, Bad Essen-Linne, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 2/502 ;
U.S. Cl.
CPC ...
C30B 2/502 ;
Abstract

The present invention relates to a process for the application of an epitactic GaN layer to a substrate by pyrolysis of precursor compounds.


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