Boulder Creek, CA, United States of America

Fred E Babian


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 192(Granted Patents)


Company Filing History:


Years Active: 1989-2000

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2 patents (USPTO):Explore Patents

Title: Fred E. Babian: Innovator in Inspection Systems

Introduction

Fred E. Babian, a distinguished inventor based in Boulder Creek, California, has made significant contributions to the field of inspection systems through his innovative work. With a total of two patents to his name, Babian's inventions focus primarily on improving the accuracy and efficiency of defect detection in semiconductor manufacturing processes.

Latest Patents

One of his latest patents is titled "Alignment Correction Prior to Image Sampling in Inspection Systems." This invention outlines a method and apparatus for inspecting a wafer that contains at least one die. The approach involves obtaining electronic images of two dies and determining the x and y offsets between those images. Before inspecting for defects, these images are aligned by adjusting their positions, allowing for a more accurate comparison and detection of any defects present on either die.

Another significant patent, "Method and Apparatus for Detecting Defects in Repeated Microminiature Patterns," describes a technique for inspecting repeating pattern devices. This method entails aligning an image of the patterns with an array of pixels in an optical detector's detection plane. By magnifying the image, features of the patterns can occupy corresponding pixels, enabling effective data resolution and defect identification through established comparison techniques.

Career Highlights

Fred E. Babian is currently affiliated with Kla Instruments Corporation, a company recognized for its advancements in precision measurement and control technologies. His work there has been influential in enhancing the reliability and performance of inspection systems used in the semiconductor industry.

Collaborations

During his career, Babian has collaborated with notable colleagues, including Bin-ming B. Tsai and Scott Allen Young. Together, they have contributed to the development of various technologies that drive innovation in image inspection and defect detection.

Conclusion

Fred E. Babian's inventive spirit and technical expertise have significantly impacted the field of semiconductor inspection. His patents reflect a commitment to improving the efficiency and effectiveness of defect detection systems, thereby fostering advancements in technology and manufacturing processes. His contributions continue to inspire and influence the industry, ensuring that the quest for precision remains at the forefront of innovation.

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