Franz Sollinger

Title: Franz Sollinger: Innovator in Semiconductor Wafer Treatment

Introduction

Franz Sollinger is a notable inventor based in Polling, Germany, recognized for his contributions to the field of semiconductor technology. With a total of four patents to his name, he has made significant advancements in the treatment of semiconductor wafers, which are crucial components in modern electronics.

Latest Patents

One of Franz Sollinger's latest patents involves a method for the treatment of a semiconductor wafer. In this innovative process, semiconductor wafers are treated in a liquid container filled at least partly with a solution containing hydrogen fluoride. This method allows for the dissolution of surface oxide, enabling the wafers to be transported out of the solution along a designated transport direction. After drying, the wafers are treated with an ozone-containing gas to oxidize their surfaces. Notably, part of the semiconductor wafer surface comes into contact with the ozone-containing gas while another part remains in contact with the solution. This unique approach ensures that the solution and the ozone-containing gas are spatially separated, preventing any contact between the two.

Career Highlights

Franz Sollinger has had a distinguished career, working with prominent companies in the semiconductor industry. He has been associated with Siltronic AG and Wacker Siltronic Gesellschaft für Halbleiter Materialien AG, where he has contributed to various projects and innovations in semiconductor materials.

Collaborations

Throughout his career, Franz has collaborated with esteemed colleagues, including Hans-Joachim Luthe and Georg-Friedrich Hohl. These partnerships have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Franz Sollinger's innovative methods for semiconductor wafer treatment highlight his significant contributions to the field. His work continues to influence the semiconductor industry, paving the way for future advancements.