Company Filing History:
Years Active: 2001-2007
Title: The Innovative Journey of Franklin D. Root
Introduction
Franklin D. Root, an accomplished inventor based in Phoenix, AZ, is recognized for his contributions to the field of chemical mechanical planarization (CMP). With two patents to his name, Root's work has significantly impacted various industries, particularly in semiconductor manufacturing and surface preparation.
Latest Patents
Franklin D. Root holds two notable patents, showcasing his expertise in CMP technologies. The first, titled "CMP Apparatus and Method," lays out methods and apparatus designed for the chemical mechanical planarization of a workpiece surface. This innovation features multiple CMP systems, load cups for handling unprocessed and processed workpieces, and cleaning stations for maintaining the quality of processed items. The inclusion of a robot for transferring materials enhances the efficiency of the process.
The second patent, "Arrangements for Wafer Polishing," presents a comprehensive wafer polishing system that consists of a series of polishing modules and secondary modules. This system utilizes a conveyor to transport wafers to storage modules after a polishing operation. It features traveling wafer gantries that apply the necessary force to ensure the surfaces are adequately polished.
Career Highlights
Franklin D. Root's career spans several prominent companies where he honed his skills and contributed to significant technological advancements. He has worked at Speedfam-IPEC Corporation and Novellus Systems Incorporated, playing essential roles in innovation and product development.
Collaborations
In his professional journey, Franklin has collaborated with notable colleagues, including Mike L. Bowman and Gene Hempel. Together, they have advanced the field of CMP technology, demonstrating Root's ability to work effectively within teams in pursuit of groundbreaking inventions.
Conclusion
Franklin D. Root stands out as a pivotal figure in the realm of inventions related to chemical mechanical planarization. His patents illustrate a commitment to improving manufacturing processes and enhancing the quality of semiconductor components. As he continues to propel innovation forward, Root's work remains critical to advancements in technology and industry practices.
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