Frank Stahr

Title: Frank Stahr: Innovator in Plasma-Assisted Treatment Technologies

Introduction

Frank Stahr is a notable inventor based in Arnsdorf, Germany. He has made significant contributions to the field of plasma-assisted treatment technologies, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Stahr's latest patents include a hollow cathode system and a device and method for the plasma-assisted treatment of substrates. The hollow cathode system features an electrically conducting main body with an opening bounded by ribs, which allows gas to pass through in a direction perpendicular to the surface of the main body. This innovative design ensures high treatment rates for homogeneous treatment of large surface area substrates with high plasma stability. Another patent involves an electrode arrangement for a coating device, which includes a stationary first electrode and a second movable electrode. This arrangement allows for improved coating processes by optimizing the positioning of the electrodes.

Career Highlights

Throughout his career, Frank Stahr has worked with prominent companies in the industry, including Applied Materials GmbH & Co. KG and Von Ardenne GmbH. His experience in these organizations has contributed to his expertise in developing advanced technologies for substrate treatment.

Collaborations

Stahr has collaborated with notable professionals in his field, including Klaus Schade and Uwe Hoffmann. These partnerships have further enriched his work and innovations.

Conclusion

Frank Stahr's contributions to plasma-assisted treatment technologies demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in substrate treatment processes, making him a valuable figure in the industry.