Company Filing History:
Years Active: 2020
Title: Frank Schleicher: Innovator in Microlithography
Introduction: Frank Schleicher is a notable inventor based in Eislingen, Germany. He has made significant contributions to the field of microlithography, particularly through his innovative patent related to projection exposure apparatuses. His work has implications for the manufacturing of integrated circuits and other advanced optical systems.
Latest Patents: Frank Schleicher holds a patent for a "Projection exposure apparatus and method for measuring a projection lens." This invention involves a microlithographic projection exposure apparatus that features a projection lens designed to image an object plane onto an image plane. The apparatus utilizes an immersion liquid during operation, which is temporarily provided between the projection lens and the image plane. A measurement structure is arranged within the immersion liquid, configured to generate a measurement pattern. Additionally, the apparatus includes a measurement device that measures this pattern. The measurement structure incorporates an absorption layer made of silicon oxide, silicon oxynitride, or nitride. This patent showcases his expertise in enhancing the precision of optical systems.
Career Highlights: Frank Schleicher is associated with Carl Zeiss SMT GmbH, a leading company in the field of optical systems and microlithography. His role at the company has allowed him to work on cutting-edge technologies that are essential for modern manufacturing processes. His contributions have been instrumental in advancing the capabilities of projection exposure systems.
Collaborations: Throughout his career, Frank has collaborated with notable colleagues, including Eugen Foca and Frank Schadt. These collaborations have fostered an environment of innovation and have led to the development of advanced technologies in the field.
Conclusion: Frank Schleicher's work in microlithography and his patented innovations demonstrate his significant impact on the industry. His contributions continue to influence the development of high-precision optical systems, marking him as a key figure in the field.