Frank S Valent

Title: Frank S Valent: Innovator in Sputtering Technology

Introduction

Frank S Valent is a notable inventor based in Galloway, OH (US). He has made significant contributions to the field of sputtering technology, particularly in the development of high-density sputtering targets. His innovative work has implications for various applications, including inkjet printing.

Latest Patents

Frank S Valent holds a patent for a composition and method for fabricating high-density Ta—Al—O, Ta—Si—N, and W—Si—N sputtering targets. This invention is particularly useful for the sputtering of heater layers for inkjet printers. The compositions involve a metal component, SiN, and a sintering aid, ensuring that the targets can sputter successfully without cracking. The components are combined in powder form and pressure consolidated under heated conditions to achieve a density greater than about 95% of the theoretical density. The final consolidated blend can then be machined to provide the desired target shape.

Career Highlights

Throughout his career, Frank has worked with prominent companies such as Tosoh SMD, Inc. and Hewlett-Packard Company. His experience in these organizations has contributed to his expertise in the field of sputtering technology.

Collaborations

Frank has collaborated with notable individuals in his field, including David B Smathers and Michael John Regan. These collaborations have likely enriched his work and contributed to the advancements in sputtering technology.

Conclusion

Frank S Valent is a distinguished inventor whose work in sputtering technology has paved the way for advancements in various applications. His innovative patent and collaborations highlight his significant contributions to the field.