Frank Runkel

Title: The Innovative Contributions of Frank Runkel

Introduction

Frank Runkel is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work has had a lasting impact on the industry, showcasing his expertise and creativity.

Latest Patents

Frank Runkel holds a patent for a "Method for the simultaneous double-sided material removal processing of a plurality of semiconductor wafers." This invention involves a device designed for double-sided processing of flat workpieces. The device features upper and lower working discs that create a working gap containing a carrier disc with cutouts for workpieces. The carrier disc is equipped with circumferential teeth that allow it to roll on inner and outer gear wheels or pin rings. These gear wheels or pin rings contain multiple gear or pin arrangements that engage the teeth of the carrier discs during operation. Additionally, at least one of the pin arrangements includes a guide that restricts the movement of the carrier disc's margin in at least one axial direction, formed by either a circumferential shoulder or a groove.

Career Highlights

Throughout his career, Frank Runkel has worked with prominent companies in the semiconductor industry. Notably, he has been associated with Siltronic AG and Peter Wolters GmbH. His experience in these organizations has contributed to his development as an inventor and has allowed him to refine his skills in semiconductor processing.

Collaborations

Frank Runkel has collaborated with several professionals in his field, including Michael Kerstan and Georg Pietsch. These collaborations have likely enriched his work and contributed to the advancement of technology in semiconductor processing.

Conclusion

Frank Runkel's innovative contributions to semiconductor processing through his patent and career experiences highlight his importance in the field. His work continues to influence the industry, demonstrating the value of creativity and collaboration in technological advancements.