Frank Palmieri

Title: Innovations of Frank Palmieri in Lithography Technology

Introduction

Frank Palmieri is an accomplished inventor based in Austin, TX (US). He has made significant contributions to the field of microelectronics through his innovative patent. His work focuses on enhancing the manufacturing processes used in integrated circuit devices.

Latest Patents

Frank Palmieri holds a patent titled "Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing." This invention introduces methods that combine step-and-flash imprint lithography (SFIL) with a multi-tier template. The goal is to simultaneously pattern multiple levels of an integrated circuit device. The imprinted material serves as insulation between levels and lines, acting as a functional dielectric material rather than a simple etch mask or photoresist. After the imprinting and a multi-step curing process, the imprinted pattern is filled with metal, which is essential in dual damascene processing. This approach represents a significant advancement in microelectronics manufacturing.

Career Highlights

Frank Palmieri is affiliated with the University of Texas System, where he continues to contribute to research and development in his field. His innovative work has garnered attention for its potential to revolutionize the way microelectronics are manufactured.

Collaborations

Frank has collaborated with notable colleagues, including C Grant Willson and Yukio Nishimura. Their combined expertise has furthered advancements in lithography technology and its applications in microelectronics.

Conclusion

Frank Palmieri's contributions to the field of lithography technology exemplify the innovative spirit of modern inventors. His patent not only enhances manufacturing processes but also paves the way for future advancements in microelectronics.