Frank P Kelly

Title: Frank P. Kelly: Innovator in Power Semiconductor Devices

Introduction

Frank P. Kelly is a notable inventor based in Champaign, IL (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of low-leakage Schottky diodes. His innovative work has implications for various applications in electronics and power devices.

Latest Patents

Frank P. Kelly holds a patent for "Low-leakage Schottky diodes and method of making a power semiconductor device." This patent describes a method of fabricating a power semiconductor device that includes forming a bi-layer mask on a semiconductor substrate. The process involves creating a first dielectric layer on the substrate, followed by a second dielectric layer. The layers are through-etched to expose a portion of the substrate, and the first dielectric layer is selectively etched to form an undercut region. Crystalline semiconductor material is then epitaxially grown on the exposed substrate, while polycrystalline material is deposited on the second dielectric layer. After the growth process, the bilayer mask and polycrystalline material are removed, resulting in a mesa with a smooth and defect-free sidewall.

Career Highlights

Frank P. Kelly's career is marked by his dedication to advancing semiconductor technology. His work at the University of Illinois has positioned him as a key figure in research and development within this field. His innovative approaches have led to advancements that enhance the performance and efficiency of power semiconductor devices.

Collaborations

Frank has collaborated with notable colleagues such as Kyekyoon Kim and Palash Sarker. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in semiconductor research.

Conclusion

Frank P. Kelly's contributions to the field of power semiconductor devices exemplify the impact of innovative thinking in technology. His patent for low-leakage Schottky diodes showcases his commitment to advancing semiconductor fabrication methods. Through his work at the University of Illinois and collaborations with fellow researchers, he continues to influence the future of semiconductor technology.