Frank P Chang

Title: Frank P Chang: Innovator in Chemical Vapor Deposition Technology

Introduction

Frank P Chang is a notable inventor based in San Jose, CA, who has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 7 patents to his name, Chang's work focuses on improving the efficiency and effectiveness of deposition systems used in semiconductor manufacturing.

Latest Patents

One of Chang's latest patents is for a high-temperature filter for CVD apparatus. This invention provides a deposition chamber designed for materials that require vaporization, particularly low volatility precursors. The chamber features heated temperature-controlled internal liners that serve as vaporizing surfaces, which can be rapidly removed, cleaned, or replaced. This design is crucial for preventing unwanted condensation on chamber components. The apparatus is particularly useful for depositing metal-oxide films, such as barium, strontium, titanium oxide (BST) films, on silicon wafers for integrated circuit capacitors.

Another significant patent by Chang is a method and apparatus for improved control of process and purge material in a substrate processing system. This deposition system includes a chamber with a lid and a vaporizer, along with valves that regulate the flow of precursor material. The design incorporates a flexible conduction line that allows for easy detachment of the lid without disassembling the conduction line, enhancing the overall efficiency of the system.

Career Highlights

Throughout his career, Frank P Chang has worked with prominent companies in the semiconductor industry, including Applied Materials, Inc. His experience in these organizations has allowed him to develop innovative solutions that address the challenges faced in the field of chemical vapor deposition.

Collaborations

Chang has collaborated with notable colleagues such as Jun Zhao and Charles N Dornfest, contributing to advancements in CVD technology through teamwork and shared expertise.

Conclusion

Frank P Chang's contributions to the field of chemical vapor deposition are marked by his innovative patents and collaborative efforts. His work continues to influence the semiconductor industry, showcasing the importance of innovation in technology development.