This inventor holds 2 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2004-2005.
Company Filing History:
Years Active: 2004-2005
Title: Frank Meyer: Innovator in Chemical Mechanical Polishing Processes
Introduction
Frank Meyer is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of chemical mechanical polishing (CMP) processes. With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of polishing techniques used in semiconductor manufacturing.
Latest Patents
Meyer’s latest patents include a method for characterizing and simulating a chemical mechanical polishing process. This innovative method involves pressing a substrate, particularly a semiconductor wafer, onto a polishing cloth while rotating it for a defined polishing time. The process includes defining various parameters such as compressive force and relative rotational speed, preparing test substrates with different structure densities, and simulating the CMP process to determine the necessary polishing time to meet specific demands.
Another significant patent by Meyer is a method for characterizing the planarizing properties of an expendable material combination in a CMP process. This method outlines steps for providing a combination of materials, performing polishing processes on test substrates, and determining parameters that characterize the planarizing properties of the selected materials.
Career Highlights
Frank Meyer is currently employed at Infineon Technologies AG, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing CMP processes, which are critical for the production of high-quality semiconductor devices.
Collaborations
Meyer collaborates with several talented individuals, including Wolfgang Dickenscheid and Stephanie Delage. Their combined expertise contributes to the ongoing development of innovative solutions in the semiconductor industry.
Conclusion
Frank Meyer is a distinguished inventor whose work in chemical mechanical polishing processes has made a significant impact on semiconductor manufacturing. His innovative methods and collaboration with skilled professionals continue to drive advancements in this essential field.