Frank Hübinger

Title: Frank Hübinger: Innovator in Wafer Mark Configuration

Introduction

Frank Hübinger is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of lithography, particularly in the production of DRAMs. His innovative work focuses on improving the alignment and determination of relative positions in substrates during lithographic exposure.

Latest Patents

Hübinger holds a patent for a mark configuration, wafer with at least one mark configuration, and a method of producing at least one mark configuration. This invention allows for a mark configuration that includes mark structures exhibiting good contrast, regardless of design or process conditions. The patent details a mark configuration that aids in the alignment of at least two planes in relation to one another in a substrate during lithographic exposure.

Career Highlights

Frank Hübinger is associated with Infineon Technologies AG, where he has been instrumental in advancing technologies related to wafer production. His expertise in mark configurations has contributed to the efficiency and effectiveness of lithographic processes in semiconductor manufacturing.

Collaborations

Hübinger has collaborated with notable colleagues such as Hans-Georg Fröhlich and Johannes Kowalewski. Their combined efforts have furthered innovations in the field of semiconductor technology.

Conclusion

Frank Hübinger's contributions to wafer mark configurations and lithographic processes highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.