Frank Havermeyer is a prominent inventor based in Arcadia, CA (US). He has made significant contributions to the field of material analysis, holding a total of 12 patents. His work focuses on the identification and analysis of materials and molecular structures, showcasing his expertise and innovative spirit.

Latest Patents

One of Frank Havermeyer's latest patents involves methods and systems for the identification and analysis of materials and molecular structures. The apparatus he developed includes a laser, which features an amplified spontaneous emission-suppressed single-frequency laser excitation source. Additionally, the apparatus comprises a plurality of filters, including reflective volume holographic grating blocking filters. It also includes an optical unit and an optical spectrometer. The optical unit is designed to deliver excitation energy to a sample substance and capture Raman signal scattering from that substance. The optical spectrometer measures the spectrum of the Raman signal and generates a detection signal. Finally, a processing unit is integrated to analyze the spectrum, enhancing the capabilities of material analysis.

Career Highlights

Frank Havermeyer is currently associated with Ondax, Inc., where he continues to push the boundaries of innovation in his field. His work has not only advanced the technology but has also contributed to the understanding of molecular structures.

Collaborations

Frank has collaborated with notable coworkers, including Christophe Moser and Lawrence Ho, who share his passion for innovation and research.

Conclusion

Frank Havermeyer stands out as a key figure in the field of material analysis, with a strong portfolio of patents and a commitment to advancing technology. His contributions are invaluable to the scientific community and continue to inspire future innovations.

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