Company Filing History:
Years Active: 2007
Title: Innovator Spotlight: Frank Frost and His Contributions to Micro-Lithography
Introduction: Frank Frost, an accomplished inventor located in Leipzig, Germany, has made significant strides in the field of micro-lithography. With a notable patent to his name, he is recognized for his innovative approach to substrate manufacturing, a critical component for advanced lithography processes.
Latest Patents: Frank Frost's pioneering patent, titled "Substrate for the micro-lithography and process of manufacturing thereof," focuses on the creation of substrates specifically designed for Extreme Ultraviolet (EUV) micro-lithography. This invention describes a substrate that features a base layer with a low coefficient of thermal expansion (CTE) and at least one cover layer made of semiconductor material, ideally silicon. The cover layer is typically applied through ion beam sputtering, enhancing the precision of the substrate. Additionally, the technology employs ion beam figuring treatments to achieve extremely accurate shapes and minimal surface roughness, thereby improving the overall quality of lithography processes.
Career Highlights: Frank Frost works at Schott AG, a leading company renowned for its advanced materials and optical systems. His contributions have positioned him as an influential figure within the company, enabling further advancement in micro-lithography applications.
Collaborations: Throughout his career, Frank has collaborated with esteemed colleagues including Lutz Aschke and Markus Schweizer. Together, they have fostered innovation and pushed the boundaries of what is achievable in the realm of semiconductor materials and lithography technologies.
Conclusion: Frank Frost's contributions to micro-lithography through his innovative patents are vital to the future of semiconductor manufacturing. His work at Schott AG, along with collaborative efforts with respected professionals in the field, showcases his dedication to advancing technology and enhancing the capabilities of modern micro-lithography.