Phoenix, AZ, United States of America

Frank Cerio

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 59(Granted Patents)


Company Filing History:


Years Active: 2004-2010

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2 patents (USPTO):Explore Patents

Title: Frank Cerio: Innovator in Ionized PVD Technology

Introduction

Frank Cerio is a notable inventor based in Phoenix, AZ, who has made significant contributions to the field of semiconductor technology. With a focus on ionized physical vapor deposition (iPVD), he has developed innovative methods that enhance the efficiency and effectiveness of material deposition on semiconductor substrates. His work has led to the granting of two patents, showcasing his expertise and commitment to advancing technology.

Latest Patents

Frank Cerio's latest patents revolve around the iPVD apparatus designed for sequential deposition and etching. This technology allows for the precise deposition of materials onto semiconductor substrates by alternating between deposition and etch modes within a vacuum chamber. The apparatus is engineered to minimize static magnetic fields during etching, ensuring optimal conditions for material removal and substrate integrity. The operational parameters, including pressure and power, are meticulously controlled to achieve high-quality results in the fabrication of submicron features.

Career Highlights

Throughout his career, Frank has been associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role has involved pioneering advancements in deposition techniques, contributing to the development of high-density plasma processes that are crucial for modern semiconductor fabrication. His innovative approaches have positioned him as a key figure in the field.

Collaborations

Frank Cerio has collaborated with esteemed colleagues such as Tugrul Yasar and Bruce David Gittleman. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies in the semiconductor sector.

Conclusion

Frank Cerio's contributions to ionized PVD technology exemplify his dedication to innovation in the semiconductor industry. His patents and career achievements reflect a commitment to advancing manufacturing processes that are essential for modern electronics.

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